SHAPAL-HI-M (Processable Aluminum Nitride) plays a crucial role in semiconductor manufacturing, and its unique performance provides important support for the semiconductor industry:

High temperature stability: High temperature treatment is required in the semiconductor manufacturing process, and SHAPAL-HI-M has excellent high temperature stability, which can maintain stable performance in high temperature environments and is not prone to deformation or thermal expansion. Therefore, it is often used to manufacture components of high-temperature furnaces, such as furnace linings and heat transfer plates.

Thermal conductivity: In the semiconductor manufacturing process, it is necessary to heat or cool the semiconductor chip to control its temperature and performance. SHAPAL-HI-M has good thermal conductivity, which can effectively conduct and disperse heat, help maintain the stable temperature of the chip, and improve the accuracy and controllability of the process.

Electrical insulation: In the semiconductor manufacturing process, various electronic devices and circuits need to be processed, so the electrical insulation of materials is crucial. SHAPAL-HI-M has excellent electrical insulation performance, which can effectively prevent electrical interference between electronic devices, improve circuit stability and reliability.

Chemical inertness: Various corrosive chemical solutions are often used in the semiconductor manufacturing process, and SHAPAL-HI-M has good chemical inertness, which can resist the erosion of various chemical substances, maintain the stability and smoothness of the material surface, and ensure the manufacturing quality of semiconductor devices.

Precision machining: SHAPAL-HI-M has excellent machining performance and can be processed into various complex shapes and sizes through processes such as grinding and polishing. Therefore, it is widely used in the manufacturing of precision components for semiconductor manufacturing equipment, such as fixtures, brackets, etc